RIE

RIE (Reactive Ion Etching) refers to reactive ion etching, a technique used for the microfabrication of thin films on semiconductor substrates. Etching gases are turned into plasma using high frequency or microwave energy, and ions are directed vertically onto the substrate under bias to react with the thin film and etch it. The vertical impact of ions is utilized to accelerate chemical reactions, achieving anisotropic etching.