A wafer with a Poly Si pattern formed on an insulating film such as a thermal oxide film.
It is used as a calibration wafer that uses pattern dimensions or position coordinates as a reference.
By doping Poly Si, it can also be used as a wiring electrode that can withstand high-temperature heat treatment.
It is also possible to evaluate insulation film coverage on Poly Si patterns.
Poly Si Pattern Wafers
Poly Si Patterned Wafers
1. Width 40 nm Poly Si Pattern
Overview of PT005 Pattern
Dense Poly Si pattern by Resist Slimming
This pattern is made by slimming the line and space resist pattern and performing Poly Si etching.
Although the repeating pitch becomes wider, a single Poly Si pattern can be made finer.
2. L&S Poly Si Pattern (Pitch: 500 nm)
This is an example of processing a thick film Poly Si pattern.
By using doped Poly Si, it can be used as electrode wiring that can withstand high temperature processing.
