If the existing pattern does not meet the evaluation purpose, we will fabricate a patterned wafer according to the customer's request.
If you specify the image drawing showing the pattern image and the minimum processing dimensions, we will also undertake the creation of CAD data (GDS II) for mask (reticle) production.
The masks we create will be equipped with marks that meet the conditions of the wafer manufacturing site.
Mask production costs vary depending on the target wafer size and minimum processing dimensions, so please contact us for details.
Custom Design Pattern Wafers
Custom Design Pattern Wafers
Work Flow for Fabrication of Customized Patterned Wafer
1. Examples of information provided by customers
Please specify the dimensions of your desired cross-sectional structure, material, and pattern layout.
2. Customized pattern GDS production
3. Create a Mask from GDS Data
We manufacture masks with specifications suitable for patterned wafer manufacturing.
The mask used in a reduction exposure machine is also called a reticle.
Binary Mask
Halftone Mask (with Pellicle)
4. Patterned wafer production using a mask
Single Wafer Case
FOSB (multiple wafer case)
Upon request, we will perform cross-sectional SEM observation during manufacturing.
Wafers can be shipped in a case containing multiple wafers (FOSB) or individually in a single wafer case.
Cross-sectional SEM image of target pattern